Why you should attend
This program is directed to patent prosecuting and litigating attorneys and patent agents with or without a Patent Office registration number or little patent experience. It will focus on teaching the basics of claim drafting, patent application preparation and prosecution, as well as a review of recent developments in the law. A litigator’s perspective is presented to show how drafting and prosecution can influence the development, and often the outcome, of subsequent patent litigation. The clinics offer a unique supplement to the kind of hands-on mentoring that senior attorneys are hard-pressed to provide to less-experienced attorneys and agents.
What you will learn
This three-day program will feature lectures each morning followed by small clinic sessions in the afternoon. Both the lecture sessions and the clinics will follow the patent application process - from invention disclosure and patent preparation (Day 1), through prosecution and issuance (Day 2) to litigation/opinion drafting (Day 3). Homework is different for each location and is specially designed to complement Chicago, New York City and San Francisco. Homework must be completed and submitted upon registering on-site at the program. Follow the homework link above.
- The lectures are designed to provide a review of the patent preparation and prosecution process and explain:
- How to decide what elements of the invention should be included in the patent
- How to prosecute an application to result in allowance of an enforceable patent
- How to interview an Examiner
- How to use reissues, reexamination supplemental examinations and other post-issuance proceedings
- How to anticipate patent litigation issues during the patent prosecution process
- How to approach patent opinion drafting
Mayer Brown partner and Co-Chair of PLI’s event Michael Molano, along with counsel Cliff Maier will be taking part in Clinic III on Day 3; in which attendees will construct a claim chart to enforce a sample invention that has now issued into a U.S. patent.
For more information or to register, please click on the button below.